Synthesis and Characterization of Graphene Films Obtained via Atmospheric Pressure Chemical Vapor Deposition
In an effort to understand few layer graphene (FLG) structure and formation under varying methane gas flow rates and temperature, the objective of the investigator of this research is to evaluate the role of atmospheric-pressure chemical vapor deposition (APCVD) conditions in FLG. Specifically, the investigator will utilize existing APCVD methods to evaluate nucleation density changes and film growth rate. FLG may then be transferred to polished silicon devices. Additional steps may include evaluation using optical microscopy, scanning electron microscopy, and atomic force microscopy of the graphene films.
Principal Investigator: Radadia, Adarsh -- Chemical Engineering
|Start Period: 05/01/2014
||End Period: 06/30/2015